UHV Surface Analysis Systems

System 1: UHV surface science / nanocluster catalysis system (SPECS GmbH).

This modular system consists of four UHV-chambers: a surface analysis chamber, a scanning tunneling microscopy chamber (variable temperature/pressure STM), a sample preparation chamber, a high pressure reaction cell, and a load lock chamber for quick sample transfer into UHV. The components that are present in each chambers are detailed below. Also available: an overview of the system, and a view of the chamber design.

 

ono-vincent-roldan500

Luis Ono, Abhilash Vincent, and Prof. Roldan

 

Sample preparation chamber:

  • 4-pocket electron beam evaporator with flux monitor (Oxford Sci.) for in-situ metal growth.
  • Dual Knudsen-cell evaporator for in-situ growth of bimetallic alloys.
  • Quartz microbalance that monitors thickness during evaporation.
  • Hybrid atom/ion Plasma source (Oxford Sci.) for H2, O2, N2 –› controlled production of ultrathin metal oxide films and removal of residual organics resulting from ex-situ nanoparticle synthesis.
  • Argon sputter gun for sample cleaning.
  • Mass spectrometer for rest gas analysis.

High pressure reaction chamber:

  • High pressure cell capable of exposing samples to pressures up to 20 bar while sealing the reaction volume from the surrounding UHV.
  • IR heater for heating samples up to 800°C.

Surface analysis chamber:

  • Hemispherical electron energy analyzer
  • Non-monochromatic (Al/Mg anodes) and monochromatic (Al/Ag anodes) X-ray sources for X-ray Photoelectron Spectroscopy (XPS) for characterization of chemical composition and electronic properties of nanomaterials.
  • Electron source (EQ 22/35, SPECS) for Auger Electron Spectroscopy (AES).
  • Ultraviolet Source for Ultraviolet Photoelectron Spectroscopy (UPS).
  • Mass spectrometer (HIDEN) for Temperature-Programmed Desorption (TPD).
  • Low Energy Electron Diffraction (LEED) for characterazing the crystalline structure of surfaces.
  • Gas manifold allowing four different gases and one vaporized liquid to be simultaneously injected into the analysis chamber.
  • Nanosecond YAG laser: 355 nm, 532 nm, 1064 nm (EKSPLA) for in-situ nanoparticle melting and re-shaping.
  • Argon sputter gun for sample cleaning.

Scanning Tunneling Microscopy chamber:

  • Variable Temperature/Pressure Scanning Tunneling microscope (Aarhus-SPECS)
  • Reaction cell with SPM head for AFM/STM, radiative heater, and near ambient pressure capability
  • Parking station with heating capabilities
  • Argon sputter gun for tip cleaning.

 

chamber fin

System 1 (SPECS) in Roldan's laboratory.

 

system-design

The original design - a joint effort between Prof. Roldan and SPECS

 

laser UHV

UHV-System 1 featuring in-situ laser-induced nanoparticle re-shaping.

 

System 2: UHV surface science / magnetic optical Kerr effect (MOKE) system (SPECS GmbH).

An additional UHV system is available for sample synthesis, morphological (STM), and magnetic characterization (magneto-optic Kerr effect-MOKE in UHV). This system includes a load-lock chamber for quick sample transfer. In addition, a vacuum suitcase has been designed to transport samples under vacuum between different UHV systems.

Sample preparation chamber:

  • 4-pocket electron beam evaporator with flux monitor (Oxford Sci.) for in-situ metal growth.
  • Hybrid atom/ion Plasma source (Oxford Sci.) for H2, O2, N2 -> controlled production of ultrathin metal oxide films and removal of residual organics resulting from ex-situ nanoparticle synthesis.
  • Argon sputter gun for sample cleaning.

Surface analysis / MOKE chamber:

  • Mass spectrometer (HIDEN) for Temperature-Programmed Desorption (TPD).
  • Manipulator capable of radiative heating and liquid He cooling.
  • MOKE setup including glass finger for optical contact with sample while in UHV, ex-situ electromagnet (1.3 T) and laser setup for longitudinal and polar MOKE measurements.

Scanning Tunneling Microscopy chamber:

  • Variable Temperature Scanning Tunneling microscope (Aarhus-SPECS)
  • Parking station with heating capabilities
  • Argon sputter gun for tip cleaning.

 

System 2

UHV-System 2 for surface analysis and MOKE.

 

Vacuum Suitcase

Vacuum suitcase for UHV sample transfer.